Ph.D student, at Hanyang University, South Korea.
Seungchan Moon is a dedicated researcher in Nanoscale Semiconductor Engineering, currently pursuing a Unified M.S. and Ph.D. at Hanyang University’s Nano Process & Device Laboratory in collaboration with SK Hynix. His research focuses on actinic metrology, coherent diffractive imaging (CDI), and through-pellicle imaging, contributing to advancements in extreme ultraviolet (EUV) lithography for next-generation semiconductor manufacturing. He has published multiple peer-reviewed articles in Applied Physics Express, Applied Optics, and Photonics, addressing key challenges in EUV mask and pellicle technology. Recognized for his impactful work, he received the Best Poster Award (First Place) at the EUVL Workshop 2022 and the Best Paper Award at KISM 2022. His expertise bridges academic innovation with industry applications, driving progress in semiconductor metrology and fabrication technologies.
Professional Profile
Scopus
Education 🎓
Seungchan Moon is currently pursuing a Unified M.S. and Ph.D. course at Hanyang University in the Nano Process & Device Laboratory, specializing in Nanoscale Semiconductor Engineering. He is also a certificate student of SK Hynix, demonstrating strong industry-academic collaboration. He earned his Bachelor’s degree in Materials Science and Engineering from Hanyang University in 2021.
Professional Experience 💼
Alongside his academic research, Seungchan is closely associated with SK Hynix, a leading semiconductor company, as a certificate student. This collaboration enhances his expertise in practical semiconductor applications and provides valuable industry exposure in nano-scale device fabrication and metrology.
Research Interests 🌍
His research primarily revolves around actinic metrology of EUV masks and pellicles, with a strong emphasis on improving coherent diffractive imaging (CDI) methods and through-pellicle imaging techniques. His work contributes significantly to advancing extreme ultraviolet (EUV) lithography, a crucial technology in next-generation semiconductor manufacturing.
Awards & Honors 🏆
Seungchan has received notable recognition for his contributions to the field. In 2022, he won the Best Poster Award (First Place) at the EUVL Workshop & Supplier Showcase for his research on pellicle reflectivity. The same year, he also received the Best Paper Award at the Korean International Semiconductor Conference on Manufacturing Technology (KISM 2022), highlighting the impact of his work in the semiconductor industry.
Top Noted Publications 📚
Seungchan has authored multiple peer-reviewed papers in high-impact journals, focusing on EUV lithography and pellicle imaging. His key publications include:
Actinic Patterned Mask Imaging Using Extreme Ultraviolet Ptychography Microscope with High Harmonic Generation Source (Applied Physics Express, 2022).
Effect of Wrinkles on Extreme Ultraviolet Pellicle Reflectivity and Local Critical Dimension (Applied Optics, 2022).
Extreme Ultraviolet Pellicle Wrinkles Influence on Mask 3D Effects: Experimental Demonstration (Applied Optics, 2023).
Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types (Photonics, 2025).
His research has provided valuable insights into pellicle defect analysis, imaging techniques, and diffraction effects, making significant contributions to advancing semiconductor manufacturing technologies.
Seungchan Moon continues to push the boundaries of nanoscale semiconductor research, with a vision to enhance the precision and efficiency of next-generation semiconductor fabrication.
Conclusion
Seungchan Moon is a strong candidate for the Best Research Article Award, given his impactful research in EUV lithography, peer-reviewed publications, and prestigious conference awards. Enhancing international collaborations and publishing in higher-impact journals could further strengthen his candidacy.